Electron-beam lithography of multiple-layer submicrometer periodic arrays on a barium fluoride substrate

Plasmonic Response of Gold Nanoparticles Arrays Made by Nanosphere Lithography and Electron Beam Lithography

Metallic nanoparticles in the 10-100 nm size range exhibit a very specific optical response in the visible spectrum. Here we present our work towards possible applications of such particles for the design of highly sensitive and miniaturized biosensors. Fabrication of nanoparticles is discussed, comprising hexagonal arrays of truncated tetrahedrons made by nanosphere lithography (NSL), and nano...

Dopant Driven Electron Beam Lithography

Introduction to Electron Beam Lithography

Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology ...

A simple electron-beam lithography system.

A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard S...

Ice-assisted electron beam lithography of graphene.

We demonstrate that a low energy focused electron beam can locally pattern graphene coated with a thin ice layer. The irradiated ice plays a crucial role in the process by providing activated species that locally remove graphene from a silicon dioxide substrate. After patterning the graphene, the ice resist is easily removed by sublimation to leave behind a clean surface with no further process...